Invention Application
- Patent Title: Recursive Inject Apparatus For Improved Distribution Of Gas
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Application No.: US16860458Application Date: 2020-04-28
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Publication No.: US20200255943A1Publication Date: 2020-08-13
- Inventor: Aaron Miller , Kallol Bera
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: C23C16/455
- IPC: C23C16/455
Abstract:
Apparatus and methods for processing a substrate including an injector unit insert with a plurality of flow paths leading to a first plenum, each of the flow paths providing one or more of substantially the same residence time, length and/or conductance. Injector units including the injector unit inserts have increased flow uniformity.
Public/Granted literature
- US11198939B2 Recursive inject apparatus for improved distribution of gas Public/Granted day:2021-12-14
Information query
IPC分类:
