- 专利标题： DISPOSABLE LASER/FLASH ANNEAL ABSORBER FOR EMBEDDED NEUROMORPHIC MEMORY DEVICE FABRICATION
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申请号： US16033384申请日： 2018-07-12
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公开(公告)号： US20200020542A1公开(公告)日： 2020-01-16
- 发明人: Kam-Leung Lee , Deborah A. Neumayer , Son Nguyen , Martin M. Frank , Vijay Narayanan
- 申请人： International Business Machines Corporation
- 主分类号： H01L21/324
- IPC分类号： H01L21/324 ; H01L21/768 ; H01L21/02 ; H01L49/02 ; H01L23/522
摘要：
A conformal disposable absorber is disclosed which is capable of providing efficient heat transfer to an embedded memory device during a localized absorber anneal, without adversary impacting the back-end-of-the-line (BEOL) structure. The disposable absorber is composed of an amorphous carbonitride material that can be designed to have a low reflection coefficient for laser/flash illumination, and a high extinction coefficient for efficient laser/flash illumination absorption. The disposable absorber is formed at a temperature of 400° C. or less.
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