Invention Application
- Patent Title: METHOD AND APPARATUS FOR PRECLEANING A SUBSTRATE SURFACE PRIOR TO EPITAXIAL GROWTH
-
Application No.: US16550933Application Date: 2019-08-26
-
Publication No.: US20190382917A1Publication Date: 2019-12-19
- Inventor: Christopher S. OLSEN , Theresa K. GUARINI , Jeffrey TOBIN , Lara HAWRYLCHAK , Peter STONE , Chi Wei LO , Saurabh CHOPRA
- Applicant: Applied Materials, Inc.
- Main IPC: C30B25/18
- IPC: C30B25/18 ; C30B29/08 ; C30B29/06
Abstract:
Embodiments of the present invention generally relate to methods for removing contaminants and native oxides from substrate surfaces. The methods generally include removing contaminants disposed on the substrate surface using a plasma process, and then cleaning the substrate surface by use of a remote plasma assisted dry etch process.
Information query
IPC分类:
