Invention Application
- Patent Title: POSITIONING SYSTEM AND LITHOGRAPHIC APPARATUS
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Application No.: US16332002Application Date: 2017-08-31
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Publication No.: US20190219932A1Publication Date: 2019-07-18
- Inventor: Krijn Frederik BUSTRAAN , Yang-Shan HUANG , Antonius Franciscus Johannes DE GROOT , Minkyu KIM , Jasper Anne Frido Marikus SIMONS , Theo Anjes Maria RUIJL , Ronald Josephus Maria LAMERS
- Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- International Application: PCT/EP2017/071870 WO 20170831
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A positioning system for positioning an object. The positioning system includes a stage, a balance mass and an actuator system. The stage is for holding the object. The actuator system is arranged to drive the stage in a first direction while driving the balance mass in a second direction opposite to the first direction. The stage is moveable in the first direction in a movement range. When the stage is moving in the first direction and is at an end of the movement range, the positioning system is arranged to collide the stage frontally into the balance mass.
Public/Granted literature
- US11003095B2 Positioning system and lithographic apparatus Public/Granted day:2021-05-11
Information query
IPC分类: