Invention Application
- Patent Title: HALL ELEMENT FOR 3-D SENSING AND METHOD FOR PRODUCING THE SAME
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Application No.: US15661826Application Date: 2017-07-27
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Publication No.: US20190036011A1Publication Date: 2019-01-31
- Inventor: Bin LIU , Eng Huat TOH , Ruchil Kumar JAIN
- Applicant: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Main IPC: H01L43/04
- IPC: H01L43/04 ; H01L43/06 ; H01L43/14 ; G01R33/07 ; G01R33/02 ; G01R33/00

Abstract:
A method of forming a 3D Hall effect sensor and the resulting device are provided. Embodiments include forming a p-type well in a substrate; forming a first n-type well in a first region surrounded by the p-type well in top view; forming a second n-type well in a second region surrounding the p-type well; providing n-type dopant in the first and second n-type wells; and providing p-type dopant in the p-type well and the first n-type well.
Public/Granted literature
- US10333056B2 Hall element for 3-D sensing and method for producing the same Public/Granted day:2019-06-25
Information query
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