Invention Application
- Patent Title: Methods And Apparatus For Depositing Tungsten Nucleation Layers
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Application No.: US16033866Application Date: 2018-07-12
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Publication No.: US20190017165A1Publication Date: 2019-01-17
- Inventor: Kai Wu , Sang Ho Yu , Vikash Banthia
- Applicant: Applied Materials, Inc.
- Main IPC: C23C16/08
- IPC: C23C16/08 ; C23C16/455
Abstract:
Methods of depositing low resistivity tungsten nucleation layers using alkyl borane reducing agents are described. Alkyl borane reducing agents utilized include compounds with the general formula BR3, where R is a C1-C6 alkyl group. Apparatus for performing atomic layer deposition of tungsten nucleation layers using alkyl borane reducing agents are also described.
Information query
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