Invention Application
- Patent Title: MULTI-LAYER PLASMA EROSION PROTECTION FOR CHAMBER COMPONENTS
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Application No.: US15965794Application Date: 2018-04-27
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Publication No.: US20180330923A1Publication Date: 2018-11-15
- Inventor: Toan Tran , Laksheswar Kalita , Tae Won Kim , Dmitry Lubomirsky , Xiaowei Wu , Xiao-Ming He , Cheng-Hsuan Chou , Jennifer Y. Sun
- Applicant: Applied Materials, Inc.
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C16/40

Abstract:
A method of applying a multi-layer plasma resistant coating on an article comprises performing plating or ALD to form a conformal first plasma resistant layer on an article, wherein the conformal first plasma resistant layer is formed on a surface of the article and on walls of high aspect ratio features in the article. The conformal first plasma resistant coating has a porosity of approximately 0% and a thickness of approximately 200 nm to approximately 1 micron. One of electron beam ion assisted deposition (EB-IAD), plasma enhanced chemical vapor deposition (PECVD), aerosol deposition or plasma spraying is then performed to form a second plasma resistant layer that covers the conformal first plasma resistant layer at a region of the surface but not at the walls of the high aspect ratio features.
Public/Granted literature
- US10755900B2 Multi-layer plasma erosion protection for chamber components Public/Granted day:2020-08-25
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