Invention Application
- Patent Title: SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
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Application No.: US15432329Application Date: 2017-02-14
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Publication No.: US20180233484A1Publication Date: 2018-08-16
- Inventor: PO-CHUN LIN , CHIN-LUNG CHU
- Applicant: NANYA TECHNOLOGY CORPORATION
- Main IPC: H01L25/065
- IPC: H01L25/065 ; H01L21/56 ; H01L25/00 ; H01L23/00

Abstract:
A semiconductor structure includes a first die; a second die disposed over or at least partially in contact with the first die; a redistribution layer (RDL) disposed over the second die; a conductive pillar extended between the first die and the RDL; and a molding surrounding the first die, the second die and the conductive pillar, wherein the first die and the RDL are electrically connected by the conductive pillar.
Information query
IPC分类: