Invention Application
- Patent Title: TARGET TRAJECTORY METROLOGY IN AN EXTREME ULTRAVIOLET LIGHT SOURCE
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Application No.: US15265373Application Date: 2016-09-14
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Publication No.: US20180077786A1Publication Date: 2018-03-15
- Inventor: Michael Leslie Price , Cory Alan Stinson , Mark Joseph Mitry
- Applicant: ASML Netherlands B.V.
- Main IPC: H05G2/00
- IPC: H05G2/00

Abstract:
A method is described for measuring a moving property of a target. The method includes: forming a remaining plasma that at least partially coincides with an extended target region, the remaining plasma being a plasma formed from an interaction between a prior target and a prior radiation pulse in a target space; releasing a current target along a trajectory toward the target space that is at least partly overlapping the extended target region; determining one or more moving properties of the current target when the current target is within the extended target region and after a prior and adjacent target has interacted with a prior radiation pulse in the target space; and if any of the determined one or more moving properties of the current target are outside an acceptable range, then adjusting one or more characteristics of a radiation pulse directed toward the target space.
Public/Granted literature
- US10149375B2 Target trajectory metrology in an extreme ultraviolet light source Public/Granted day:2018-12-04
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