• 专利标题: FABRIC HAVING UNEVEN-SURFACE DESIGN, AND METHOD FOR PRODUCING SAME
  • 申请号: US15533225
    申请日: 2015-12-10
  • 公开(公告)号: US20170342658A1
    公开(公告)日: 2017-11-30
  • 发明人: Kazunori KAWAMURA
  • 申请人: SEIREN CO., LTD.
  • 优先权: JP2014-253379 20141215
  • 国际申请: PCT/JP2015/006171 WO 20151210
  • 主分类号: D06Q1/08
  • IPC分类号: D06Q1/08 D06C23/04
FABRIC HAVING UNEVEN-SURFACE DESIGN, AND METHOD FOR PRODUCING SAME
摘要:
Provided is a fabric to which an uneven-surface design which is fine and has flexibility and wear resistance is imparted. The fabric has a polyurethane resin applied portion on at least a portion of a surface side of the fabric, and an uneven-surface design shaped on the polyurethane resin applied portion. The polyurethane resin applied portion is a region in which a polyurethane resin which is applied is present, and the polyurethane resin permeates between the fibers at least in a surface portion of the fabric such that a surface of the fabric is formed by the polyurethane resin and the fibers. In the polyurethane resin applied portion, an application depth of the polyurethane resin is 50 to 200 μm, a filling ratio of the polyurethane resin is 15% to 45%, and a filling ratio of the fibers of the fabric is 50% to 80%.
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