Invention Application
- Patent Title: ETCHANT COMPOSITION, METHOD FOR ETCHING MULTILAYERED FILM, AND METHOD FOR PREPARING DISPLAY DEVICE
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Application No.: US15518130Application Date: 2015-10-07
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Publication No.: US20170306501A1Publication Date: 2017-10-26
- Inventor: Jung-Ig JEON , Chi-Sung IHN , Mi-Soon LEE , Hyun-Eok SHIN , Joon-Woo BAE
- Applicant: SAMYOUNG PURE CHEMICALS CO., LTD. , MITSUBISHI GAS CHEMICAL COMPANY, INC. , SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Chungcheongnam-do JP Tokyo KR Gyeonggi-do
- Assignee: SAMYOUNG PURE CHEMICALS CO., LTD.,MITSUBISHI GAS CHEMICAL COMPANY, INC.,SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMYOUNG PURE CHEMICALS CO., LTD.,MITSUBISHI GAS CHEMICAL COMPANY, INC.,SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Chungcheongnam-do JP Tokyo KR Gyeonggi-do
- Priority: KR10-2014-0136592 20141010
- International Application: PCT/KR2015/010586 WO 20151007
- Main IPC: C23F1/18
- IPC: C23F1/18 ; H01L27/12 ; H01L21/3213 ; C23F1/30

Abstract:
Embodiments provide an etchant composition including (A) a copper ion source, (B) a source of an organic acid ion having one or more carboxyl groups in a molecule, (C) a fluoride ion source, (D) an etching controller, a surface oxidizing power enhancer or a combination thereof as a first additive, and (E) a surfactant as a second additive; a method for etching a multilayered film; and a method for preparing a display device.
Information query
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