Invention Application
- Patent Title: SOLVENT RESISTANT POLYMERIC MEMBRANES
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Application No.: US15403530Application Date: 2017-01-11
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Publication No.: US20170121529A1Publication Date: 2017-05-04
- Inventor: Izabela STRUZYNSKA-PIRON , Ivo VANKELECOM , Luc VANMAELE , Johan LOCCUFIER
- Applicant: AGFA-GEVAERT , KATHOLIEKE UNIVERSITEIT LEUVEN
- Priority: EP12161017.4 20120323
- Main IPC: C09D4/06
- IPC: C09D4/06 ; C08F283/04 ; B01D67/00 ; B01D69/12 ; B01D71/52 ; B01D71/68 ; B01D71/64 ; B01D71/82 ; C08F283/00 ; B01D69/06

Abstract:
A radiation curable composition for preparing a polymeric membrane includes a) a membrane polymer selected from the group consisting of a polysulfone (PSU), a polyether sulfone (PES), a polyether etherketone (PEEK), a polyvinylchloride (PVC), a polyacrylonitrile (PAN), a polyvinylidene fluoride (PVDF), a polyimide (PI), a polyamide (PA) and copolymers thereof; b) a hydrophobic monomer or oligomer having at least two free radical polymerizable groups independently selected from the group consisting of an acrylate group, a methacrylate group, an acrylamide group, a methacrylamide group, a styrene group, a vinyl ether group, a vinyl ester group, a maleate group, a fumarate group, an itaconate group, and a maleimide group; and c) an organic solvent for the membrane polymer and the hydrophobic monomer. A polymeric membrane and a method for manufacturing the membrane are also disclosed.
Information query
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