- 专利标题: APPARATUS FOR MONITORING PULSED HIGH-FREQUENCY POWER AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
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申请号: US15291193申请日: 2016-10-12
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公开(公告)号: US20170103871A1公开(公告)日: 2017-04-13
- 发明人: Jong Hwan AN , Shin-Woo NAM , Hong Won LEE , Jae Bak SHIM
- 申请人: SEMES CO., LTD.
- 申请人地址: KR Cheonan-si
- 专利权人: SEMES CO., LTD.
- 当前专利权人: SEMES CO., LTD.
- 当前专利权人地址: KR Cheonan-si
- 优先权: KR10-2015-0142288 20151012
- 主分类号: H01J37/32
- IPC分类号: H01J37/32 ; G01R29/02 ; H03H7/24 ; G01R23/10 ; H02M7/04 ; H03H7/38
摘要:
Disclosed are an apparatus for monitoring pulsed high-frequency power and a substrate processing apparatus including the same. The apparatus includes an attenuation module configured to attenuate a pulsed high-frequency power signal; a rectifier module configured to convert the pulsed high-frequency power signal into a direct current signal; and a detection module configured to detect a pulse parameter based on the direct current signal.
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