Invention Application
US20170069587A1 CONDUCTIVE CONTACTS HAVING VARYING WIDTHS AND METHOD OF MANUFACTURING SAME
审中-公开
具有变化宽度的导电性接触件及其制造方法
- Patent Title: CONDUCTIVE CONTACTS HAVING VARYING WIDTHS AND METHOD OF MANUFACTURING SAME
- Patent Title (中): 具有变化宽度的导电性接触件及其制造方法
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Application No.: US15356316Application Date: 2016-11-18
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Publication No.: US20170069587A1Publication Date: 2017-03-09
- Inventor: Yen-Liang Lin , Yu-Jen Tseng , Chang-Chia Huang , Tin-Hao Kuo , Chen-Shien Chen
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Main IPC: H01L23/00
- IPC: H01L23/00

Abstract:
A bump structure includes a contact element formed on a substrate and a passivation layer overlying the substrate. The passivation layer includes a passivation opening exposing the contact element. The bump structure also includes a polyimide layer overlying the passivation layer and an under bump metallurgy (UBM) feature electrically coupled to the contact element. The polyimide layer has a polyimide opening exposing the contact element, and the under bump metallurgy feature has a UBM width. The bump structure further includes a copper pillar on the under bump metallurgy feature. A distal end of the copper pillar has a pillar width, and the UBM width is greater than the pillar width.
Public/Granted literature
- US09953939B2 Conductive contacts having varying widths and method of manufacturing same Public/Granted day:2018-04-24
Information query
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