Invention Application
- Patent Title: SEMICONDUCTOR STRUCTURE
- Patent Title (中): 半导体结构
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Application No.: US15096293Application Date: 2016-04-12
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Publication No.: US20170047277A1Publication Date: 2017-02-16
- Inventor: Yuan-Fu Lan , Hsien-Wen Hsu
- Applicant: Powertech Technology Inc.
- Priority: TW104126612 20150814
- Main IPC: H01L23/498
- IPC: H01L23/498 ; H05K3/26 ; H05K1/02 ; H05K3/00

Abstract:
Provided is a semiconductor structure including a first die and a second die. The first die has a first conductive structure embedded in a dielectric layer. The second die has a second conductive structure embedded in the dielectric layer. A first interface is provided between the first conductive structure and the dielectric layer. A second interface is provided between the second conductive structure and the dielectric layer. A shape of the dielectric layer between the first interface and the second interface is a non-linear shape.
Information query
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