Invention Application
US20170040194A1 PROCESS SHEET RESISTANCE UNIFORMITY IMPROVEMENT USING MULTIPLE MELT LASER EXPOSURES
有权
使用多次熔融激光曝光的工艺流程电阻均匀性改进
- Patent Title: PROCESS SHEET RESISTANCE UNIFORMITY IMPROVEMENT USING MULTIPLE MELT LASER EXPOSURES
- Patent Title (中): 使用多次熔融激光曝光的工艺流程电阻均匀性改进
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Application No.: US15207226Application Date: 2016-07-11
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Publication No.: US20170040194A1Publication Date: 2017-02-09
- Inventor: Jiping LI , Aaron Muir HUNTER , Bruce E. ADAMS , Kim VELLORE , Samuel C. HOWELLS , Stephen MOFFATT
- Applicant: Applied Materials, Inc.
- Main IPC: H01L21/67
- IPC: H01L21/67 ; B23K26/0622 ; B23K26/00 ; B23K26/03 ; H01L21/268 ; H01L21/324
Abstract:
Embodiments described herein relate to apparatus and methods of thermal processing. More specifically, apparatus and methods described herein relate to laser thermal treatment of semiconductor substrates by increasing the uniformity of energy distribution in an image at a surface of a substrate.
Public/Granted literature
- US09953851B2 Process sheet resistance uniformity improvement using multiple melt laser exposures Public/Granted day:2018-04-24
Information query
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