Invention Application
- Patent Title: ION GENERATOR MOUNTING DEVICE
- Patent Title (中): 离子发生器安装装置
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Application No.: US15268717Application Date: 2016-09-19
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Publication No.: US20170000921A1Publication Date: 2017-01-05
- Inventor: Charles Houston WADDELL
- Applicant: Global Plasma Solutions, LLC
- Applicant Address: US GA Savannah
- Assignee: Global Plasma Solutions, LLC
- Current Assignee: Global Plasma Solutions, LLC
- Current Assignee Address: US GA Savannah
- Main IPC: A61L9/22
- IPC: A61L9/22 ; H01J37/08 ; B03C3/82 ; F24F3/16 ; B03C3/04 ; B03C3/41 ; H01J27/02 ; H01J37/16

Abstract:
The present invention provides methods and systems for an ion generator mounting device for application of bipolar ionization to airflow within a conduit, the device includes a housing for mounting to the conduit having an internal panel within the enclosure, and an arm extending from the housing for extension into the conduit and containing at least one opening. At least one coupling for mounting an ion generator to the arm oriented with an axis extending between a pair of electrodes of the ion generator being generally perpendicular to a flow direction of the airflow within the conduit.
Public/Granted literature
- US09925292B2 Ion generator mounting device Public/Granted day:2018-03-27
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