发明申请
US20160238951A1 ROLL TO ROLL MASK-LESS LITHOGRAPHY WITH ACTIVE ALIGNMENT
审中-公开
滚动以无主动对齐的方式滚动无障碍的LITHOGRAPHY
- 专利标题： ROLL TO ROLL MASK-LESS LITHOGRAPHY WITH ACTIVE ALIGNMENT
- 专利标题（中）： 滚动以无主动对齐的方式滚动无障碍的LITHOGRAPHY
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申请号： US15026763申请日： 2014-09-24
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公开(公告)号： US20160238951A1公开(公告)日： 2016-08-18
- 发明人: John M. WHITE
- 申请人： APPLIED MATERIALS, INC.
- 国际申请： PCT/US2014/057120 WO 20140924
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; H01L21/677 ; H01L51/00 ; H01L21/66 ; H01L51/56 ; H01L31/18
摘要：
Embodiments of the present invention relates to apparatus and methods for a maskless lithography on a flexible substrate with active alignment. In one embodiment, a lithography apparatus includes a cylindrical roller rotatable about a central axis and configured to transfer a flexible substrate on a cylindrical substrate supporting surface. A plurality of printing units, each includes an image sensing device and an imaging printing device, may be positioned facing the substrate supporting surface. The plurality of printing units may capture images of pre-existing patterns and/or markers on the flexible substrate as the flexible substrate is being tramsferred continiously and exposure patterns for each printing unit may be adjusted “on-the-fly” according to the captured image, thus achieving active alignment.
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