Invention Application
- Patent Title: LOCALIZED HIGH DENSITY SUBSTRATE ROUTING
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Application No.: US15049500Application Date: 2016-02-22
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Publication No.: US20160197037A1Publication Date: 2016-07-07
- Inventor: Robert Starkston , Debendra Mallik , John S. Guzek , Chia-Pin Chiu , Deepak Kulkarni , Ravindranath V. Mahajan
- Applicant: Intel Corporation
- Main IPC: H01L23/522
- IPC: H01L23/522 ; H01L25/065 ; H01L23/00

Abstract:
Embodiments of a system and methods for localized high density substrate routing are generally described herein. In one or more embodiments an apparatus includes a medium, first and second circuitry elements, an interconnect element, and a dielectric layer. The medium can include low density routing therein. The interconnect element can be embedded in the medium, and can include a plurality of electrically conductive members therein, the electrically conductive member can be electrically coupled to the first circuitry element and the second circuitry element. The interconnect element can include high density routing therein. The dielectric layer can be over the interconnect die, the dielectric layer including the first and second circuitry elements passing therethrough.
Public/Granted literature
- US09679843B2 Localized high density substrate routing Public/Granted day:2017-06-13
Information query
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