Invention Application
- Patent Title: SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
- Patent Title (中): 基板支架，光刻装置，装置制造方法及制造基板支架的方法
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Application No.: US15014829Application Date: 2016-02-03
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Publication No.: US20160170314A1Publication Date: 2016-06-16
- Inventor: Raymond Wilhelmus Louis LAFARRE , Nicolaas TEN KATE , Nina Vladimirovna DZIOMKINA , Yogesh Pramod KARADE , Siegfried Alexander TROMP , Jacobus Josephus LEIJSSEN , Elisabeth Corinne RODENBURG , Maurice Wilhelmus Leonardus Hendricus FEIJTS , Hendrik HUISMAN
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G03F7/20
- IPC: G03F7/20 ; B05D3/02
Abstract:
A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The thin film stack comprises an (optional) isolation layer, a metal layer forming an electrode, a sensor, a heater, a transistor or a logic device, and a top isolation layer.
Public/Granted literature
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