Invention Application
- Patent Title: PACKAGE STRUCTURE AND FABRICATION METHOD THEREOF
- Patent Title (中): 包装结构及其制造方法
-
Application No.: US14836613Application Date: 2015-08-26
-
Publication No.: US20160126126A1Publication Date: 2016-05-05
- Inventor: Yan-Heng Chen , Chun-Tang Lin , Chieh-Yuan Chi
- Applicant: Siliconware Precision Industries Co., Ltd.
- Priority: TW103138012 20141103
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L21/768 ; H01L21/027 ; H01L23/31 ; H01L23/48 ; H01L21/56 ; H01L23/00

Abstract:
A method for fabricating a package structure is provided, including the steps of: disposing on a carrier a semiconductor chip having an active surface facing the carrier; forming a patterned resist layer on the carrier; forming on the carrier an encapsulant exposing an inactive surface of the semiconductor chip and a surface of the patterned resist layer; and removing the carrier to obtain a package structure. Thereafter, redistribution layers can be formed on the opposite sides of the package structure, and a plurality of through holes can be formed in the patterned resist layer by drilling, thus allowing a plurality of conductive through holes to be formed in the through holes for electrically connecting the redistribution layers on the opposite sides of the package structure. Therefore, the invention overcomes the conventional drawback of surface roughness of the through holes caused by direct drilling the encapsulant having filler particles.
Public/Granted literature
- US09842758B2 Package structure and fabrication method thereof Public/Granted day:2017-12-12
Information query
IPC分类: