Invention Application
- Patent Title: SYSTEMS AND METHODS FOR METAL ARTIFACT REDUCTION
- Patent Title (中): 金属制品减少的系统和方法
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Application No.: US14920991Application Date: 2015-10-23
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Publication No.: US20160117850A1Publication Date: 2016-04-28
- Inventor: Yannan Jin , Bruno Kristiaan Bernard De Man , Ge Wang , Yan Xi
- Applicant: GENERAL ELECTRIC COMPANY
- Main IPC: G06T11/00
- IPC: G06T11/00 ; G06T5/00 ; A61B6/00

Abstract:
A method includes receiving, with at least one processor, a first projection dataset corresponding to X-rays at a first energy level projected towards a subject at a first set of view angles and receiving, with the at least one processor, a second projection dataset corresponding to X-rays at a second energy level projected towards the subject at a second set of view angles. The method further includes identifying, with the at least one processor, a metal trace from at least one of the first projection dataset and the second projection dataset. Moreover, the method includes converting, with the at least one processor, at least a portion of the first projection dataset to a pseudo dataset at the second energy level. The method also includes generating, with the at least one processor, a final image of the subject based on the second projection dataset, the pseudo dataset, and the metal trace.
Public/Granted literature
- US09655580B2 Systems and methods for metal artifact reduction Public/Granted day:2017-05-23
Information query
IPC分类:
G | 物理 |
G06 | 计算;推算或计数 |
G06T | 一般的图像数据处理或产生 |
G06T11/00 | 2D〔二维〕图像的生成 |