Invention Application
- Patent Title: METHOD FOR MANUFACTURING SILICON CARBIDE SINGLE CRYSTAL
- Patent Title (中): 制造单晶碳化硅的方法
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Application No.: US14828807Application Date: 2015-08-18
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Publication No.: US20160083865A1Publication Date: 2016-03-24
- Inventor: Takashi SAKURADA , Tomohiro KAWASE , Tsutomu HORI , Sho SASAKI
- Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Priority: JP2014-194088 20140924; JP2015-088543 20150423
- Main IPC: C30B23/06
- IPC: C30B23/06 ; C30B33/02

Abstract:
After growing a silicon carbide single crystal, silicon carbide single crystal is cooled. The step of growing silicon carbide single crystal includes a step of growing silicon carbide single crystal while maintaining the temperature of a second main surface of a base opposite to a first main surface to be lower than the temperature of a surface of silicon carbide single crystal facing a silicon carbide source material. In the step of cooling silicon carbide single crystal, silicon carbide single crystal is cooled while maintaining the temperature of second main surface of base to be not less than the temperature of surface of silicon carbide single crystal.
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