Invention Application
- Patent Title: PROCESSING SYSTEMS AND METHODS FOR HALIDE SCAVENGING
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Application No.: US14936448Application Date: 2015-11-09
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Publication No.: US20160064233A1Publication Date: 2016-03-03
- Inventor: Anchuan Wang , Xinglong Chen , Zihui Li , Hiroshi Hamana , Zhijun Chen , Ching-Mei Hsu , Jiayin Huang , Nitin K. Ingle , Dmitry Lubomirsky , Shankar Venkataraman , Randhir Thakur
- Applicant: Applied Materials, Inc.
- Main IPC: H01L21/3065
- IPC: H01L21/3065
Abstract:
Systems, chambers, and processes are provided for controlling process defects caused by moisture contamination. The systems may provide configurations for chambers to perform multiple operations in a vacuum or controlled environment. The chambers may include configurations to provide additional processing capabilities in combination chamber designs. The methods may provide for the limiting, prevention, and correction of aging defects that may be caused as a result of etching processes performed by system tools.
Public/Granted literature
- US09704723B2 Processing systems and methods for halide scavenging Public/Granted day:2017-07-11
Information query
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