发明申请
- 专利标题： POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER
- 专利标题（中）： 抛光垫与基础层和抛光表面层
-
申请号： US14736568申请日： 2015-06-11
-
公开(公告)号： US20150273656A1公开(公告)日： 2015-10-01
- 发明人: William C. Allison , Diane Scott , Paul Andre Lefevre , James P. LaCasse , Alexander William Simpson
- 申请人： William C. Allison , Diane Scott , Paul Andre Lefevre , James P. LaCasse , Alexander William Simpson
- 主分类号： B24B37/24
- IPC分类号： B24B37/24 ; B24B37/22 ; B24B37/26 ; B24B37/20
摘要：
Polishing pads with foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer. A polishing surface layer is bonded to the foundation layer. Methods of fabricating polishing pads with a polishing surface layer bonded to a foundation layer are also described.
信息查询
