Invention Application
- Patent Title: SYSTEMS AND METHODS FOR X-RAY DIFFRACTION
- Patent Title (中): X射线衍射的系统和方法
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Application No.: US14639460Application Date: 2015-03-05
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Publication No.: US20150253262A1Publication Date: 2015-09-10
- Inventor: Iuliana Cernatescu , David U. Furrer
- Applicant: UNITED TECHNOLOGIES CORPORATION
- Main IPC: G01N23/20
- IPC: G01N23/20 ; G01N23/207

Abstract:
An x-ray diffraction system includes an x-ray source having a first interchangeable x-ray generating component, a second interchangeable x-ray generating component, an actuator and a controller operatively connected to the actuator. The first and second interchangeable x-ray generating components are interchangeable with one another. The actuator is operatively connected to the first and second interchangeable x-ray generating components. A method for non-destructive x-ray diffraction includes emitting a first x-ray beam from an x-ray source with a first x-ray generating component based on a first desired depth to measure a crystallographic signature of a sample at the first desired depth, interchanging the first x-ray generating component with a second x-ray generating component to form a modified x-ray source, and emitting a second x-ray beam from the modified x-ray source based on a second desired depth, to non-destructively measure a crystallographic signature of the sample at the second desired depth.
Public/Granted literature
- US09976971B2 Systems and methods for X-ray diffraction Public/Granted day:2018-05-22
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