Invention Application
- Patent Title: MAGNETIC DEVICE AND LITHOGRAPHIC APPARATUS
- Patent Title (中): 磁性装置和光刻装置
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Application No.: US14415518Application Date: 2013-06-18
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Publication No.: US20150212430A1Publication Date: 2015-07-30
- Inventor: Fidelus Adrianus Boon , Olof Martinus Josephus Fischer
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- International Application: PCT/EP2013/062629 WO 20130618
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01F7/02

Abstract:
A magnetic device, comprising a first part, a second part, a first magnetic part coupled to the first part and having a first magnetic polarization, a second magnetic part coupled to the second part and having a second magnetic polarization and an additional magnetic part coupled to the first part and having an additional magnetic polarization, wherein the first magnetic part and the second magnetic part are configured to magnetically interact with each other, wherein the first magnetic part exerts a first force on the second magnetic part, the second magnetic part exerts a second force on the first magnetic part and the first force and the second force have opposite directions that are parallel to a reference direction, the first magnetic polarization is substantially parallel to the reference direction, the second magnetic polarization is substantially perpendicular to the reference direction, the additional magnetic polarization makes an angle with the first magnetic polarization and the angle has a magnitude in a range of about 90° to about 270°.
Public/Granted literature
- US09519230B2 Magnetic device and lithographic apparatus Public/Granted day:2016-12-13
Information query
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