发明申请
- 专利标题： PHOTOCATALYTIC FILM STRUCTURE
- 专利标题（中）： 光电膜结构
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申请号： US14248799申请日： 2014-04-09
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公开(公告)号： US20150182950A1公开(公告)日： 2015-07-02
- 发明人: Wu-Han Liu , Wei-Tien Hsiao , Mao-Shin Liu , Ming-Sheng Leu , Cherng-Yuh Su , Fuh-Sheng Shieu , Chin-Te Lu
- 申请人： INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- 申请人地址： TW Hsinchu
- 专利权人： Industrial Technology Research Institute
- 当前专利权人： Industrial Technology Research Institute
- 当前专利权人地址： TW Hsinchu
- 优先权： TW102149236 20131231
- 主分类号： B01J23/06
- IPC分类号： B01J23/06
摘要：
A photocatalytic film structure is provided. The photocatalytic film includes a plurality of micron particles; a plurality of nano particles; and a plurality of block bodies, wherein the volume of each of the block bodies is greater than that of each of the nano particles, and each of the micron particles, the nano particles and the block bodies contains zinc oxide and a doping metal, and wherein the amount of the doping metal is 1 to 5 wt % of the photocatalytic film, and the plurality of micron particles and micron particles take up 10 to 50% of the volume of the photocatalytic film.
公开/授权文献
- US09381494B2 Photocatalytic film structure 公开/授权日：2016-07-05
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