Invention Application
- Patent Title: PATTERN FORMATION METHOD, STAMPER MANUFACTURING METHOD, AND MAGNETIC RECORDING MEDIUM MANUFACTURING METHOD
- Patent Title (中): 图案形成方法,冲压件制造方法和磁记录介质制造方法
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Application No.: US14206271Application Date: 2014-03-12
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Publication No.: US20150179205A1Publication Date: 2015-06-25
- Inventor: Kazutaka TAKIZAWA , Takeshi IWASAKI , Akihiko TAKEO
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Minato-ku
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Minato-ku
- Priority: JP2013-265759 20131224
- Main IPC: G11B5/84
- IPC: G11B5/84 ; G11B5/85 ; C25D1/10

Abstract:
According to one embodiment, a pattern formation method includes steps of forming a layer to be processed on a substrate, forming a metal microparticle layer by coating the layer to be processed with a metal microparticle coating solution containing metal microparticles and a solvent, reducing a protective group amount around the metal microparticles by first etching, forming a protective layer by exposing the substrate to a gas containing C and F and adsorbing the gas around the metal microparticles to obtain a projection pattern, and transferring the projection pattern to the layer to be processed by second etching.
Public/Granted literature
- US09324355B2 Pattern formation method, stamper manufacturing method, and magnetic recording medium manufacturing method Public/Granted day:2016-04-26
Information query
IPC分类: