发明申请
US20150168830A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE, AND COMPOUND
审中-公开
丙烯酸类敏感性或辐射敏感性树脂组合物,使用它们的电阻膜,图案形成方法和制造电子器件和电子器件的方法和化合物
- 专利标题: ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE, AND COMPOUND
- 专利标题(中): 丙烯酸类敏感性或辐射敏感性树脂组合物,使用它们的电阻膜,图案形成方法和制造电子器件和电子器件的方法和化合物
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申请号: US14633721申请日: 2015-02-27
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公开(公告)号: US20150168830A1公开(公告)日: 2015-06-18
- 发明人: Akiyoshi GOTO , Akinori SHIBUYA , Shohei KATAOKA , Shuhei YAMAGUCHI , Tomoki MATSUDA , Keita KATO
- 申请人: FUJIFILM CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM CORPORATION
- 当前专利权人: FUJIFILM CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2012-191849 20120831
- 主分类号: G03F7/027
- IPC分类号: G03F7/027 ; G03F7/20 ; C07D327/06 ; C07D279/12 ; G03F7/038 ; C07D217/08 ; C07D335/02 ; C07D333/46 ; C07C323/21 ; G03F7/30 ; C07D411/04
摘要:
There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound represented by Formula (1): wherein R1 represents a polycyclic aromatic group or a polycyclic heterocyclic aromatic group, R2 represents a (n+2)-valent saturated hydrocarbon group. R3 represents a (m+2)-valent saturated hydrocarbon group, R4 and R5 each independently represent a substituent, Q represents a linking group containing a heteroatom, m and n each independently represent an integer of 0 to 12, when n is 2 or more, R4's may be the same or different, R4's may be linked to each other to form a non-aromatic ring together with R2, when m is 2 or more, R5's may be the same or different, and R5's may be linked to each other to form a non-aromatic ring together with R3, and X− represents a non-nucleophilic anion.
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