发明申请
- 专利标题: SEMICONDUCTOR LIGHT EMITTING DEVICE, NITRIDE SEMICONDUCTOR LAYER, AND METHOD FOR FORMING NITRIDE SEMICONDUCTOR LAYER
- 专利标题(中): 半导体发光器件,氮化物半导体层和形成氮化物半导体层的方法
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申请号: US14301022申请日: 2014-06-10
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公开(公告)号: US20140295602A1公开(公告)日: 2014-10-02
- 发明人: Toshiki Hikosawa , Yoshiyuki Harada , Maki Sugai , Shinya Nunoue
- 申请人: KABUSHIKI KAISHA TOSHIBA
- 申请人地址: JP Minato-ku
- 专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人地址: JP Minato-ku
- 优先权: JP2011-115584 20110524
- 主分类号: H01L33/00
- IPC分类号: H01L33/00 ; H01L33/48 ; H01L33/32
摘要:
According to an embodiment, a semiconductor light emitting device includes a foundation layer, a first semiconductor layer, a light emitting layer, and a second semiconductor layer. The foundation layer has an unevenness having recesses, side portions, and protrusions. A first major surface of the foundation layer has an overlay-region. The foundation layer has a plurality of dislocations including first dislocations whose one ends reaching the recess and second dislocations whose one ends reaching the protrusion. A proportion of a number of the second dislocations reaching the first major surface to a number of all of the second dislocations is smaller than a proportion of a number of the first dislocations reaching the first major surface to a number of all of the first dislocations. A number of the dislocations reaching the overlay-region of the first major surface is smaller than a number of all of the first dislocations.
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