发明申请
US20140197132A1 BLOCK COPOLYMER, METHOD OF FORMING THE SAME, AND METHOD OF FORMING PATTERN
有权
嵌段共聚物,其形成方法和形成图案的方法
- 专利标题: BLOCK COPOLYMER, METHOD OF FORMING THE SAME, AND METHOD OF FORMING PATTERN
- 专利标题(中): 嵌段共聚物,其形成方法和形成图案的方法
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申请号: US14086182申请日: 2013-11-21
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公开(公告)号: US20140197132A1公开(公告)日: 2014-07-17
- 发明人: Min Hyuck KANG , Su Mi LEE , Myung Im KIM , Tae Woo KIM , Seung-Won PARK , Xie LEI , Na Na KANG , Bong-Jin MOON , Joona BANG , Sang Hoon WOO , Jin Yeong LEE , Hyun Jung JUNG , June HUH
- 申请人: Samsung Display Co., Ltd. , Sogang University Research Foundation , KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
- 申请人地址: KR Yongin-City KR Seoul KR Seoul
- 专利权人: Samsung Display Co., Ltd.,Sogang University Research Foundation,KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
- 当前专利权人: Samsung Display Co., Ltd.,Sogang University Research Foundation,KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
- 当前专利权人地址: KR Yongin-City KR Seoul KR Seoul
- 优先权: KR10-2013-0003439 20130111
- 主分类号: C08F32/06
- IPC分类号: C08F32/06
摘要:
A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.
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