发明申请
- 专利标题： INNOVATIVE TOP-COAT APPROACH FOR ADVANCED DEVICE ON-WAFER PARTICLE PERFORMANCE
- 专利标题（中）： 用于先进设备的创新顶盖方法片上粒子性能
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申请号： US13759525申请日： 2013-02-05
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公开(公告)号： US20140030533A1公开(公告)日： 2014-01-30
- 发明人: Jennifer Y. Sun , Biraja P. Kanungo , Dmirty Lubomirsky , Vahid Fioruzdor
- 申请人： APPLIED MATERIALS, INC.
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： B05D3/14
- IPC分类号： B05D3/14 ; H01L21/67
摘要：
To manufacture a coating for an article for a semiconductor processing chamber, the coating is applied to the article by a method including applying a sol-gel coating of Y2O3 over the article, and curing the sol-gel coating on the article by heating the article with the sol-gel coating and exposing the article with the sol-gel coating to plasma in a semiconductor manufacturing chamber.
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