Invention Application
- Patent Title: THIN FILM EVALUATION METHOD, MASK BLANK, AND TRANSFER MASK
- Patent Title (中): 薄膜评估方法，遮罩和转印面膜
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Application No.: US13871582Application Date: 2013-04-26
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Publication No.: US20130236819A1Publication Date: 2013-09-12
- Inventor: Kazuya SAKAI , Masaru TANABE
- Applicant: HOYA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: HOYA CORPORATION
- Current Assignee: HOYA CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2010-115833 20100519
- Main IPC: G03F1/50
- IPC: G03F1/50
Abstract:
Provided is a thin film evaluation method for a transfer mask which is adapted to be applied with ArF excimer laser exposure light and comprises a thin film formed with a pattern on a transparent substrate. The method includes intermittently irradiating pulsed laser light onto the thin film to thereby evaluate the irradiation durability of the thin film.
Public/Granted literature
- US08609307B2 Thin film evaluation method, mask blank, and transfer mask Public/Granted day:2013-12-17
Information query
