发明申请
- 专利标题： Photosensitive Novolac Resin, Positive Photosensitive Resin Composition Including Same, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film
- 专利标题（中）： 光敏酚醛清漆树脂，含有它们的正型感光性树脂组合物，使用它们的感光性树脂膜和包含感光性树脂膜的半导体装置
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申请号： US13590440申请日： 2012-08-21
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公开(公告)号： US20130171563A1公开(公告)日： 2013-07-04
- 发明人: Jong-Hwa LEE , Hyun-Yong CHO , Min-Kook CHUNG , Ji-Young JEONG , Myoung-Hwan CHA
- 申请人： Jong-Hwa LEE , Hyun-Yong CHO , Min-Kook CHUNG , Ji-Young JEONG , Myoung-Hwan CHA
- 申请人地址： KR Gumi-si
- 专利权人： CHEIL INDUSTRIES INC.
- 当前专利权人： CHEIL INDUSTRIES INC.
- 当前专利权人地址： KR Gumi-si
- 优先权： KR10-2011-0146190 20111229
- 主分类号： C08G8/28
- IPC分类号： C08G8/28 ; G03F7/075 ; G03F7/023
摘要：
Disclosed is a photosensitive novolac resin including a structural unit represented by the following Chemical Formula 1 and structural unit represented by the following Chemical Formula 2, wherein R11, R12, R13, and R14 in Chemical Formulae 1 and 2 are the same as defined in the detailed description, a positive photosensitive resin composition including the same, a photosensitive resin film fabricated using the same, and a semiconductor device including the photosensitive resin composition.
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