- 专利标题: METHOD FOR FABRICATING A MICROARRAY OF SOFT MATERIALS
- 专利标题(中): 微软材料制作方法
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申请号: US13814588申请日: 2012-03-27
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公开(公告)号: US20130136863A1公开(公告)日: 2013-05-30
- 发明人: Satoshi Hiyama , Kaori Kuribayashi , Hiroaki Onoe , Shoji Takeuchi
- 申请人: Satoshi Hiyama , Kaori Kuribayashi , Hiroaki Onoe , Shoji Takeuchi
- 申请人地址: JP Chiyoda-ku
- 专利权人: NTT DOCOMO, INC.
- 当前专利权人: NTT DOCOMO, INC.
- 当前专利权人地址: JP Chiyoda-ku
- 优先权: JP2011-070934 20110328
- 国际申请: PCT/JP12/57996 WO 20120327
- 主分类号: B05D1/32
- IPC分类号: B05D1/32
摘要:
A method for fabricating a microarray of plural soft materials includes: vapor-depositing a first layer poly(para-xylylene) resin on a substrate, forming a first micro pattern in the poly(para-xylylene) resin; obtaining a substrate including a first microarray formed by pouring a first soft material solution, freeze-drying the first soft material to obtain a micro-arrayed substrate of the freeze-dried first soft material; vapor-depositing a second layer poly(para-xylylene) resin on the micro-arrayed substrate of the freeze-dried first soft material, forming a second micro pattern placed differently from the first micro pattern by penetrating the poly(para-xylylene) resin of the first and second layers, forming a second microarray on the substrate by pouring a second soft material solution; and forming a microarray of the first and second soft materials on the substrate by peeling off the poly(para-xylylene) resin of the first and second layers.
公开/授权文献
- US08999443B2 Method for fabricating a microarray of soft materials 公开/授权日:2015-04-07
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