发明申请
- 专利标题： TEMPLATE SUBSTRATE AND METHOD FOR MANUFACTURING SAME
- 专利标题（中）： 模板基板及其制造方法
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申请号： US13423043申请日： 2012-03-16
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公开(公告)号： US20130001753A1公开(公告)日： 2013-01-03
- 发明人: Shingo Kanamitsu , Masamitsu Itoh
- 申请人： Shingo Kanamitsu , Masamitsu Itoh
- 优先权： JP2011-14673 20110630
- 主分类号： H01L29/06
- IPC分类号： H01L29/06 ; H01L21/30
摘要：
According to one embodiment, a template substrate includes a substrate and a mask. The substrate includes a mesa region formed in a central portion of an upper surface of the substrate. The mesa region is configured to protrude more than a region of the substrate around the mesa region. An impurity is introduced into an upper layer portion of a partial region of a peripheral portion of the mesa region. The mask film is provided on the upper surface of the substrate.
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