Invention Application
- Patent Title: Graphene Devices with Local Dual Gates
- Patent Title (中): 石墨烯器件与本地双门
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Application No.: US12986342Application Date: 2011-01-07
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Publication No.: US20120175594A1Publication Date: 2012-07-12
- Inventor: Zhihong Chen , Aaron Daniel Franklin , Shu-Jen Han
- Applicant: Zhihong Chen , Aaron Daniel Franklin , Shu-Jen Han
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Main IPC: H01L29/15
- IPC: H01L29/15 ; H01L21/336

Abstract:
An electronic device comprises an insulator, a local first gate embedded in the insulator with a top surface of the first gate being substantially coplanar with a surface of the insulator, a first dielectric layer formed over the first gate and insulator, and a channel. The channel comprises a bilayer graphene layer formed on the first dielectric layer. The first dielectric layer provides a substantially flat surface on which the channel is formed. A second dielectric layer formed over the bilayer graphene layer and a local second gate formed over the second dielectric layer. Each of the local first and second gates is capacitively coupled to the channel of the bilayer graphene layer. The local first and second gates form a first pair of gates to locally control a first portion of the bilayer graphene layer.
Public/Granted literature
- US09076873B2 Graphene devices with local dual gates Public/Granted day:2015-07-07
Information query
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