Invention Application
- Patent Title: THROUGH WIRING SUBSTRATE AND MANUFACTURING METHOD THEREOF
- Patent Title (中): 通过接线基板及其制造方法
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Application No.: US13344091Application Date: 2012-01-05
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Publication No.: US20120103679A1Publication Date: 2012-05-03
- Inventor: Satoshi YAMAMOTO , Hirokazu HASHIMOTO
- Applicant: Satoshi YAMAMOTO , Hirokazu HASHIMOTO
- Applicant Address: JP Tokyo
- Assignee: FUJIKURA LTD.
- Current Assignee: FUJIKURA LTD.
- Current Assignee Address: JP Tokyo
- Priority: JP2009-159869 20090706
- Main IPC: H05K1/11
- IPC: H05K1/11 ; H05K3/00

Abstract:
A through wiring substrate includes a substrate having a first face and a second face; and a through-wire formed by filling, or forming a film of, an electrically-conductive substance into a through-hole, which penetrates between the first face and the second face. The through-hole has a bend part comprising an inner peripheral part that is curved in a recessed shape and an outer peripheral part that is curved in a protruding shape, in a longitudinal cross-section of the through-hole, and at least the inner peripheral part is formed in a circular arc shape in the longitudinal cross-section.
Public/Granted literature
- US08785791B2 Through wiring substrate and manufacturing method thereof Public/Granted day:2014-07-22
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