Invention Application
- Patent Title: MEASURING APPARATUS
- Patent Title (中): 测量装置
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Application No.: US13308523Application Date: 2011-11-30
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Publication No.: US20120068177A1Publication Date: 2012-03-22
- Inventor: Ra-Min Tain , Ming-Ji Dai , Shyh-Shyuan Sheu , Chih-Sheng Lin , Shih-Hsien Wu
- Applicant: Ra-Min Tain , Ming-Ji Dai , Shyh-Shyuan Sheu , Chih-Sheng Lin , Shih-Hsien Wu
- Applicant Address: TW Hsinchu
- Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: TW Hsinchu
- Main IPC: H01L25/07
- IPC: H01L25/07

Abstract:
A measuring apparatus including a first chip, a first circuit layer, a first heater, a first stress sensor and a second circuit layer is provided. The first chip has a first through silicon via, a first surface and a second surface opposite to the first surface. The first circuit layer is disposed on the first surface. The first heater and the first stress sensor are disposed on the first surface and connected to the first circuit layer. The second circuit layer is disposed on the second surface. The first heater comprises a plurality of first switches connected in series to generate heat.
Public/Granted literature
Information query
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