Invention Application
US20110241208A1 MICROELECTRONIC PACKAGE CONTAINING SILICON CONNECTING REGION FOR HIGH DENSITY INTERCONNECTS, AND METHOD OF MANUFACTURING SAME 有权
含有高密度互连的硅连接区域的微电子封装及其制造方法

  • Patent Title: MICROELECTRONIC PACKAGE CONTAINING SILICON CONNECTING REGION FOR HIGH DENSITY INTERCONNECTS, AND METHOD OF MANUFACTURING SAME
  • Patent Title (中): 含有高密度互连的硅连接区域的微电子封装及其制造方法
  • Application No.: US13161538
    Application Date: 2011-06-16
  • Publication No.: US20110241208A1
    Publication Date: 2011-10-06
  • Inventor: Ravi MahajanSandeep Sane
  • Applicant: Ravi MahajanSandeep Sane
  • Main IPC: H01L23/48
  • IPC: H01L23/48
MICROELECTRONIC PACKAGE CONTAINING SILICON CONNECTING REGION FOR HIGH DENSITY INTERCONNECTS, AND METHOD OF MANUFACTURING SAME
Abstract:
A microelectronic package comprises a substrate (110), a silicon patch (120) embedded in the substrate, a first interconnect structure (131) at a first location of the silicon patch and a second interconnect structure (132) at a second location of the silicon patch, and an electrically conductive line (150) in the silicon patch connecting the first interconnect structure and the second interconnect structure to each other.
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