Invention Application
US20110241121A1 Semiconductor Devices Including SRAM Cell and Methods for Fabricating the Same 有权
包括SRAM单元的半导体器件及其制造方法

  • Patent Title: Semiconductor Devices Including SRAM Cell and Methods for Fabricating the Same
  • Patent Title (中): 包括SRAM单元的半导体器件及其制造方法
  • Application No.: US13009602
    Application Date: 2011-01-19
  • Publication No.: US20110241121A1
    Publication Date: 2011-10-06
  • Inventor: OhKyum KwonByungsun KimTaejung Lee
  • Applicant: OhKyum KwonByungsun KimTaejung Lee
  • Priority: KR10-2010-0031480 20100406
  • Main IPC: H01L27/11
  • IPC: H01L27/11
Semiconductor Devices Including SRAM Cell and Methods for Fabricating the Same
Abstract:
An SRAM cell of a semiconductor device includes a load transistor, a driver transistor and an access transistor. First source/drains of the load, driver and access transistors are connected to a node. A power line, a ground line and a bit line are electrically connected to second source/drains of the load transistor, the driver transistor and the access transistor. The power line, the ground line and the bit line are disposed at substantially the same level to extend in a first direction. A word line is electrically connected to a gate of the access transistor to extend in a second direction perpendicular to the first direction. The word line is disposed at a different level from the level of the power line, the ground line and the bit line.
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