发明申请
US20110180793A1 THIN FILM TRANSISTOR, METHOD OF MANUFACTURING THIN FILM TRANSISTOR, DISPLAY UNIT, AND ELECTRONIC DEVICE 有权
薄膜晶体管,制造薄膜晶体管的方法,显示单元和电子器件

  • 专利标题: THIN FILM TRANSISTOR, METHOD OF MANUFACTURING THIN FILM TRANSISTOR, DISPLAY UNIT, AND ELECTRONIC DEVICE
  • 专利标题(中): 薄膜晶体管,制造薄膜晶体管的方法,显示单元和电子器件
  • 申请号: US13006736
    申请日: 2011-01-14
  • 公开(公告)号: US20110180793A1
    公开(公告)日: 2011-07-28
  • 发明人: Satoshi Taniguchi
  • 申请人: Satoshi Taniguchi
  • 申请人地址: JP Tokyo
  • 专利权人: SONY CORPORATION
  • 当前专利权人: SONY CORPORATION
  • 当前专利权人地址: JP Tokyo
  • 优先权: JP2010-014339 20100126
  • 主分类号: H01L29/12
  • IPC分类号: H01L29/12 H01L21/336 H01L33/16
THIN FILM TRANSISTOR, METHOD OF MANUFACTURING THIN FILM TRANSISTOR, DISPLAY UNIT, AND ELECTRONIC DEVICE
摘要:
There is provided a thin film transistor including: a gate electrode; a pair of source/drain electrodes; a first oxide semiconductor layer provided between the gate electrode, and the pair of source/drain electrodes, and forming a channel; and a second oxide semiconductor layer provided on the pair of source/drain electrodes side of the first oxide semiconductor layer, and having a polarity different from that of the first oxide semiconductor layer.
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