发明申请
US20110163277A1 OXIDE SINTERED COMPACT FOR PREPARING TRANSPARENT CONDUCTIVE FILM 审中-公开
用于制备透明导电膜的氧化物烧结紧密

  • 专利标题: OXIDE SINTERED COMPACT FOR PREPARING TRANSPARENT CONDUCTIVE FILM
  • 专利标题(中): 用于制备透明导电膜的氧化物烧结紧密
  • 申请号: US13063151
    申请日: 2009-09-18
  • 公开(公告)号: US20110163277A1
    公开(公告)日: 2011-07-07
  • 发明人: Masakatsu IkisawaMasataka Yahagi
  • 申请人: Masakatsu IkisawaMasataka Yahagi
  • 优先权: JP2008-246504 20080925
  • 国际申请: PCT/JP2009/066394 WO 20090918
  • 主分类号: H01B1/02
  • IPC分类号: H01B1/02 C23C14/34
OXIDE SINTERED COMPACT FOR PREPARING TRANSPARENT CONDUCTIVE FILM
摘要:
The present invention provides an ITO amorphous transparent conductive film used in a display electrode for a flat panel display or the like, which can be produced without heating a substrate and without feeding water during the sputtering, while achieving both high etchability and lower resistivity at high levels. An oxide sintered compact containing indium oxide as a main component, while containing one or more elements selected from nickel, manganese, aluminum and germanium as a first additive element, with the total content of the first additive element being 2-12 atom % relative to the total content of indium and the first additive element.
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