Invention Application
- Patent Title: Perpendicular magnetic tunnel junctions, magnetic devices including the same and method of manufacturing a perpendicular magnetic tunnel junction
- Patent Title (中): 垂直磁隧道结,包括相同的磁性装置和制造垂直磁隧道结的方法
-
Application No.: US12926442Application Date: 2010-11-18
-
Publication No.: US20110149647A1Publication Date: 2011-06-23
- Inventor: Kwang-seok Kim , Taek-dong Lee , Woo-jin Kim , Sun-ae Seo , Kee-won Kim , Sun-ok Kim
- Applicant: Kwang-seok Kim , Taek-dong Lee , Woo-jin Kim , Sun-ae Seo , Kee-won Kim , Sun-ok Kim
- Assignee: Samsung Electronics Co., Ltd.,Korean Advanced Institute of Science and Technology
- Current Assignee: Samsung Electronics Co., Ltd.,Korean Advanced Institute of Science and Technology
- Priority: KR10-2009-0128344 20091221
- Main IPC: G11C11/14
- IPC: G11C11/14 ; H01L29/82 ; H01L21/02

Abstract:
Provided are a perpendicular magnetic tunnel junction (MTJ), a magnetic device including the same, and a method of manufacturing the MTJ, the perpendicular MTJ includes a lower magnetic layer; a tunnelling layer on the lower magnetic layer; and an upper magnetic layer on the tunnelling layer. One of the upper and lower magnetic layers includes a free magnetic layer that exhibits perpendicular magnetic anisotropy, wherein the magnetizing direction of the free magnetic layer is changed by a spin polarization current. A polarization enhancing layer (PEL) and an exchange blocking layer (EBL) are stacked between the tunnelling layer and the free magnetic layer.
Information query