发明申请
- 专利标题: Mechanical patterning of thin film photovoltaic materials and structure
- 专利标题(中): 薄膜光伏材料和结构的机械图案化
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申请号: US12577133申请日: 2009-10-09
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公开(公告)号: US20110020977A1公开(公告)日: 2011-01-27
- 发明人: Robert D. Wieting
- 申请人: Robert D. Wieting
- 申请人地址: US CA San Jose
- 专利权人: Stion Corporation
- 当前专利权人: Stion Corporation
- 当前专利权人地址: US CA San Jose
- 主分类号: H01L31/032
- IPC分类号: H01L31/032
摘要:
A method for forming one or more patterns for a thin film photovoltaic material. The method includes providing a substrate including a molybdenum layer and an overlying absorber comprising a copper bearing species and a window layer comprising a cadmium bearing species. The substrate is supported to expose a surface of the window layer. In a specific embodiment, the method includes using a scribe device. The scribe device includes a scribe having a tip. The scribe device is configured to pivot about one or more regions and configured to apply pressure to the tip, such that the tip is placed on a selected region of the window layer or the absorber layer. The method moves the scribe device relative to the substrate in a direction to form a pattern on at least the window layer or the absorber layer at a determined speed maintaining the molybdenum layer free from the pattern.
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