发明申请
- 专利标题: SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SAME
- 专利标题(中): 半导体器件及其制造方法
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申请号: US12823453申请日: 2010-06-25
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公开(公告)号: US20100258876A1公开(公告)日: 2010-10-14
- 发明人: Tomoyuki Miyake , Masatoshi Morikawa , Yutaka Hoshino , Makoto Hatori
- 申请人: Tomoyuki Miyake , Masatoshi Morikawa , Yutaka Hoshino , Makoto Hatori
- 优先权: JP2003-313971 20030905
- 主分类号: H01L27/088
- IPC分类号: H01L27/088
摘要:
To reduce the size and improve the power added efficiency of an RF power module having an amplifier element composed of a silicon power MOSFET, the on resistance and feedback capacitance, which were conventionally in a trade-off relationship, are reduced simultaneously by forming the structure of an offset drain region existing between a gate electrode and an n+ type drain region of the power MOSFET into a double offset one. More specifically, this is accomplished by adjusting the impurity concentration of an n− type offset drain region, which is closest to the gate electrode, to be relatively low and adjusting the impurity concentration of an n type offset drain region, which is distant from the gate electrode, to be relatively high.
公开/授权文献
- US07994567B2 Semiconductor device and a method of manufacturing the same 公开/授权日:2011-08-09
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