发明申请
US20100116645A1 SURFACE PROCESSING METHOD AND MANUFACTURING METHOD OF RECORDING MEDIUM
审中-公开
表面处理方法和记录介质的制造方法
- 专利标题： SURFACE PROCESSING METHOD AND MANUFACTURING METHOD OF RECORDING MEDIUM
- 专利标题（中）： 表面处理方法和记录介质的制造方法
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申请号： US12593250申请日： 2007-03-27
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公开(公告)号： US20100116645A1公开(公告)日： 2010-05-13
- 发明人: Yoichi Sato , Shigeru Horigome , Satoshi Takiguchi , Yasutake Takamatsu , Katsunori Takahashi
- 申请人： Yoichi Sato , Shigeru Horigome , Satoshi Takiguchi , Yasutake Takamatsu , Katsunori Takahashi
- 申请人地址： JP Minato-ku, Tokyo
- 专利权人： SHOWA DENKO K.K.
- 当前专利权人： SHOWA DENKO K.K.
- 当前专利权人地址： JP Minato-ku, Tokyo
- 国际申请： PCT/JP2007/056396 WO 20070327
- 主分类号： C23C14/40
- IPC分类号： C23C14/40
摘要：
A surface processing method of processing a surface of a substrate includes disposing the substrate in a vacuum chamber, processing by applying a high-frequency voltage to the substrate and by sputtering the surface of the substrate, measuring a cathode drop potential generated at the substrate in the processing and obtaining a time integration value of the cathode drop potential, and determining whether or not a processed state of the surface of the substrate is good based on the time integration value obtained in the measuring.
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