发明申请
- 专利标题: ELECTROSTATIC DISCHARGE PROJECTION SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- 专利标题(中): 静电放电投影半导体器件及其制造方法
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申请号: US12545271申请日: 2009-08-21
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公开(公告)号: US20100084711A1公开(公告)日: 2010-04-08
- 发明人: Jong-Min Kim , Jong-Kyu Song , San-Hong Kim
- 申请人: Jong-Min Kim , Jong-Kyu Song , San-Hong Kim
- 优先权: KR10-2008-0097104 20081002
- 主分类号: H01L29/78
- IPC分类号: H01L29/78 ; H01L21/336
摘要:
An electrical device, including a semiconductor device such an electrostatic discharge protection semiconductor device, and a method for manufacturing the same. An electrostatic discharge protection semiconductor device may include a substrate and a gate in and/or over the substrate. The gate may be multi-layered, and may include a gate oxide layer and a gate electrode. An electrostatic discharge protection semiconductor device may include a source region formed in and/or over a predetermined area of the substrate on a side of the gate, and a plurality of drain regions which may be sequentially multi-layered in and/or over the substrate on an opposing side of the gate in a vertical direction. At least one drain region may be overlapped with the gate in a horizontal direction.
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