Invention Application
US20100065935A1 Structure and method to fabricate high performance MTJ devices for spin-transfer torque (STT)-RAM
有权
用于制造自旋转矩(STT)-RAM的高性能MTJ装置的结构和方法
- Patent Title: Structure and method to fabricate high performance MTJ devices for spin-transfer torque (STT)-RAM
- Patent Title (中): 用于制造自旋转矩(STT)-RAM的高性能MTJ装置的结构和方法
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Application No.: US12284066Application Date: 2008-09-18
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Publication No.: US20100065935A1Publication Date: 2010-03-18
- Inventor: Cheng T. Horng , Ru-Ying Tong , Chyu-Jiuh Torng , Po-Kang Wang , Robert Beach , Witold Kula
- Applicant: Cheng T. Horng , Ru-Ying Tong , Chyu-Jiuh Torng , Po-Kang Wang , Robert Beach , Witold Kula
- Assignee: MagIC Technologies, Inc.
- Current Assignee: MagIC Technologies, Inc.
- Main IPC: H01L29/82
- IPC: H01L29/82 ; H01L21/00

Abstract:
A STT-RAM MTJ is disclosed with a MgO tunnel barrier formed by a NOX process, a CoFeB/FeSiO/CoFeB composite free layer with a middle nanocurrent channel layer to minimize Jc0, and a Ru capping layer to enhance the spin scattering effect and increase dR/R. Good write margin is achieved by modifying the NOX process to afford a RA less than 10 ohm-μm2 and good read margin is realized with a dR/R of >100% by annealing at 330° C. or higher to form crystalline CoFeB free layers. The NCC thickness is maintained in the 6 to 10 Angstrom range to reduce Rp and avoid Fe(Si) granules from not having sufficient diameter to bridge the distance between upper and lower CoFeB layers. A FeSiO layer may be inserted below the Ru layer in the capping layer to prevent the Ru from causing a high damping constant in the upper CoFeB free layer.
Public/Granted literature
- US08138561B2 Structure and method to fabricate high performance MTJ devices for spin-transfer torque (STT)-RAM Public/Granted day:2012-03-20
Information query
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